著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Comprehensive Study of Low Temperature (<1000℃) Oxidation Process in SiGe/SOI Structures,Thin Solid Films 517,,,2008,,,245-247,https://cir.nii.ac.jp/crid/1010000781684247683,