著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Arrhenius and non-Arrhenius behavior during anisotropic etching,"Proc.the 4^<th> Workshop on Physical Chemistry of Wet Etching of Silicon, Montreal #13",,,2004,,,1-6,https://cir.nii.ac.jp/crid/1010000781776670596,