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Postoxidation annealing treatments to improve Si/ultrathin SiO_2, characteristics formed by nitric acid oxidation
Bibliographic Information
- Title
- Postoxidation annealing treatments to improve Si/ultrathin SiO_2, characteristics formed by nitric acid oxidation
- Author
- Asuha, L.Yueh-Ling, 0.Maida, M.Takahashi, H.Kobayashi
- Published
- 2004
- Resource Type
- journal article
Journal
-
- Journal of the Electrochemical Society 151
-
Journal of the Electrochemical Society 151 2004
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Details 詳細情報について
-
- CRID
- 1010000781820793345
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
