著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Thermal Stability of Nitrided Si Atomic Layer on Ge(100) Using Low Pressure CVD,"2nd Int.Workshop on New Group IV Semiconductor Nanoelectronics, Tohoku Univ., Sendai, Japan, Oct.2-3,2006 No.P-28",,,2006,,,75-76,https://cir.nii.ac.jp/crid/1010000781874555034,