Thermal Stability of Nitrided Si Atomic Layer on Ge(100) Using Low Pressure CVD
書誌事項
- タイトル
- Thermal Stability of Nitrided Si Atomic Layer on Ge(100) Using Low Pressure CVD
- 著者
- N.Akiyama et al.
収録刊行物
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- 2nd Int.Workshop on New Group IV Semiconductor Nanoelectronics, Tohoku Univ., Sendai, Japan, Oct.2-3,2006 No.P-28
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2nd Int.Workshop on New Group IV Semiconductor Nanoelectronics, Tohoku Univ., Sendai, Japan, Oct.2-3,2006 No.P-28 75-76, 2006