Theoretical analysis of the oxygen insertion process in the oxidation reactions of H_2O + H/ Si(100) Surface and 2H + H_2O/ Si(100) : a molecular orbital calculation and an analysis of tunneling reaction
書誌事項
- タイトル
- Theoretical analysis of the oxygen insertion process in the oxidation reactions of H_2O + H/ Si(100) Surface and 2H + H_2O/ Si(100) : a molecular orbital calculation and an analysis of tunneling reaction
- 著者
- H., Watanabe, S., Nanbu, J., Maki, Z.-H., Wang, T., Urisu, M., Aoyagi, K., Ooi
収録刊行物
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- Chem. Phys. Lett 383
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Chem. Phys. Lett 383 523-527, 2004
