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Surface reconstruction during halogen-etching of Si(111) surface at high-temperature ------ Stress to align the nano-cluster
Bibliographic Information
- Title
- Surface reconstruction during halogen-etching of Si(111) surface at high-temperature ------ Stress to align the nano-cluster
- Author
- K.Shudo, Y.Koike, Y.Owa, M.Koma, S.Ohno, M.Tanaka
Journal
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- Activity Report of 141st Committee on Microbeam Analysis Japan Society for the Promotion of Science (JSPS). (in press)(8月予定)
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Activity Report of 141st Committee on Microbeam Analysis Japan Society for the Promotion of Science (JSPS). (in press)(8月予定) 2006
- Tweet
Details 詳細情報について
-
- CRID
- 1010000781890801286
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN