Surface reconstruction during halogen-etching of Si(111) surface at high-temperature ------ Stress to align the nano-cluster

Bibliographic Information

Title
Surface reconstruction during halogen-etching of Si(111) surface at high-temperature ------ Stress to align the nano-cluster
Author
K.Shudo, Y.Koike, Y.Owa, M.Koma, S.Ohno, M.Tanaka

Journal

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Details 詳細情報について

  • CRID
    1010000781890801286
  • Article Type
    journal article
  • Data Source
    • KAKEN

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