Surface reconstruction during halogen-etching of Si(111) surface at high-temperature ------ Stress to align the nano-cluster
書誌事項
- タイトル
- Surface reconstruction during halogen-etching of Si(111) surface at high-temperature ------ Stress to align the nano-cluster
- 著者
- K.Shudo, Y.Koike, Y.Owa, M.Koma, S.Ohno, M.Tanaka
収録刊行物
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- Activity Report of 141st Committee on Microbeam Analysis Japan Society for the Promotion of Science (JSPS). (in press)(8月予定)
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Activity Report of 141st Committee on Microbeam Analysis Japan Society for the Promotion of Science (JSPS). (in press)(8月予定) 2006