著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography,Appl. Phys. Express,,,2016,9,,056501,https://cir.nii.ac.jp/crid/1010000781910665096,