Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
書誌事項
- タイトル
- Sub-70nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography
- 著者
- Satoshi Takei and Makoto Hanabata
収録刊行物
-
- Appl. Phys. Express
-
Appl. Phys. Express 9 056501-, 2016
- Tweet
詳細情報
-
- CRID
- 1010000781910665096
-
- 資料種別
- journal article
-
- データソース種別
-
- KAKEN