Generation of Solid-Source H_2O Plasma and Its Application to Dry Etching of CaF_2
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- 松谷 晃宏
- 東京工業大学
書誌事項
- タイトル
- Generation of Solid-Source H_2O Plasma and Its Application to Dry Etching of CaF_2
- 著者
- Akihiro Matsutani, Hideo Ohtsuki, Fumio Koyama
収録刊行物
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- Japanese Journal of Applied Physics 47(In press)
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Japanese Journal of Applied Physics 47(In press) 2008