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Interface engineering by PVD-based in situ fabrication method for advanced metal/high-k gate stacks
Bibliographic Information
- Title
- Interface engineering by PVD-based in situ fabrication method for advanced metal/high-k gate stacks
- Author
- H., Kitano, et. al.
Journal
-
- ECS Transactions 6
-
ECS Transactions 6 71-85, 2007
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Details 詳細情報について
-
- CRID
- 1010000782006892813
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN