Interface engineering by PVD-based in situ fabrication method for advanced metal/high-k gate stacks
書誌事項
- タイトル
- Interface engineering by PVD-based in situ fabrication method for advanced metal/high-k gate stacks
- 著者
- H., Kitano, et. al.
- 公開日
- 2007
- 資源種別
- journal article
収録刊行物
-
- ECS Transactions 6
-
ECS Transactions 6 71-85, 2007