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Model for Effects of Rf Bias Frequency and Waveform on Si Damaged-Layer Formation during Plasma Etching
Bibliographic Information
- Title
- Model for Effects of Rf Bias Frequency and Waveform on Si Damaged-Layer Formation during Plasma Etching
- Author
- K.Eriguchi, Y.Takao, K.Ono
- Published
- 2011
- Resource Type
- journal article
Journal
-
- Jpn.J.Appl.Phys. 50(掲載予定)
-
Jpn.J.Appl.Phys. 50(掲載予定) 2011
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Details 詳細情報について
-
- CRID
- 1010000782035626624
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
