Model for Effects of Rf Bias Frequency and Waveform on Si Damaged-Layer Formation during Plasma Etching
書誌事項
- タイトル
- Model for Effects of Rf Bias Frequency and Waveform on Si Damaged-Layer Formation during Plasma Etching
- 著者
- K.Eriguchi, Y.Takao, K.Ono
- 公開日
- 2011
- 資源種別
- journal article
収録刊行物
-
- Jpn.J.Appl.Phys. 50(掲載予定)
-
Jpn.J.Appl.Phys. 50(掲載予定) 2011
