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Comparative study of plasma-charging damage in high-k dielectric and P-N junction and their effects on off-state leakage current of metal-oxide-semiconductor field-effect transistors
Bibliographic Information
- Title
- Comparative study of plasma-charging damage in high-k dielectric and P-N junction and their effects on off-state leakage current of metal-oxide-semiconductor field-effect transistors
- Author
- M.Kamei, Y.Takao, K.Eriguchi, K.Ono
Journal
-
- Jpn.J.Appl.Phys 50(掲載予定)
-
Jpn.J.Appl.Phys 50(掲載予定) 2011
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Details 詳細情報について
-
- CRID
- 1010000782035626626
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
