著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Hexagonality and stacking sequence dependence of etching properties in Cl_2-O_2-SiC system,Mat.Sci.Forum 645巻,,,2010,,,771-774,https://cir.nii.ac.jp/crid/1010000782045205249,