Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO2 Thin Films

Bibliographic Information

Title
Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO2 Thin Films
Author
Vol.48Sunichiro Fujii, Shin-Ichiro Kuroki, Masaki Numata, Koji Kotani, and Takashi Ito

Journal

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Details 詳細情報について

  • CRID
    1010000782071054088
  • Article Type
    journal article
  • Data Source
    • KAKEN

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