Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO2 Thin Films
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- 黒木 伸一郎
- 東北大学
書誌事項
- タイトル
- Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO2 Thin Films
- 著者
- Vol.48Sunichiro Fujii, Shin-Ichiro Kuroki, Masaki Numata, Koji Kotani, and Takashi Ito
収録刊行物
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- Jpn. J. Appl. Phys.
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Jpn. J. Appl. Phys. Vol.48 2009