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Low-temperature-atomic-layer-deposition of SiO_2 with tris (dimethylamino) silane (TDMAS) and ozone using a temperature controlled water vapor treatment
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- HIROSE Fumihiko
- 山形大学
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- NARITA Yuzuru
- 山形大学
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- KIMURA Yasuo
- 東北大学
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- NIWANO Michio
- 東北大学
Bibliographic Information
- Title
- Low-temperature-atomic-layer-deposition of SiO_2 with tris (dimethylamino) silane (TDMAS) and ozone using a temperature controlled water vapor treatment
- Author
- 廣瀬文彦、木下友太、渋谷豪、成田克、宮博信、平原和弘、木村康男、庭野道夫
- Published
- 2009
- Resource Type
- journal article
Journal
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- ECS Transactions 19
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ECS Transactions 19 417-428, 2009
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Details 詳細情報について
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- CRID
- 1010000782076726027
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- Article Type
- journal article
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- Data Source
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- KAKEN
