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Possibility of forming 18-nm-pitch ultrahigh density fine dot arrays for 2 Tbit/in.2 patterned media using 30-keV electron beam lithography
Bibliographic Information
- Title
- Possibility of forming 18-nm-pitch ultrahigh density fine dot arrays for 2 Tbit/in.2 patterned media using 30-keV electron beam lithography
- Author
- S. Hosaka, Y. Tanaka, M. Shirai, Z. Mohamad, Y. Yin
- Published
- 2010
- Resource Type
- journal article
Journal
-
- Jpn. J. Appl. Phys
-
Jpn. J. Appl. Phys 49 1-3, 2010
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Details 詳細情報について
-
- CRID
- 1010000782092824458
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
