Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication
書誌事項
- タイトル
- Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication
- 著者
- S.Higashi, S.Hayashi, Y.Hiroshige, Y.Nishida, H.Murakami, S.Miyazaki
収録刊行物
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- Jpn.J.Appl.Phys.
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Jpn.J.Appl.Phys. 50 2011