Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication
Bibliographic Information
- Title
- Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication
- Author
- S.Higashi, S.Hayashi, Y.Hiroshige, Y.Nishida, H.Murakami, S.Miyazaki
Journal
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- Jpn.J.Appl.Phys.
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Jpn.J.Appl.Phys. 50 2011
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Details
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- CRID
- 1010000782110617856
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- Article Type
- journal article
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- Data Source
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- KAKEN