Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication

Bibliographic Information

Title
Application of Thermal Plasma Jet Irradiation to Crystallization and Gate Insulator Improvement for High-Performance Thin-Film Transistor Fabrication
Author
S.Higashi, S.Hayashi, Y.Hiroshige, Y.Nishida, H.Murakami, S.Miyazaki

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Details

  • CRID
    1010000782110617856
  • Article Type
    journal article
  • Data Source
    • KAKEN

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