著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Evaluation of contribution of higher-order silane radicals in silane discharges to Si-H_2 bond formation in a-Si:H films,Proceedings of International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources (in press),,,2004,,,,https://cir.nii.ac.jp/crid/1010282256753462152,