著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,50 nm gate electrode patterning using a neutral-beam etching system,Journal of Vacuum Science and Technology A22・4,,,2004,,,1506-1512,https://cir.nii.ac.jp/crid/1010282256781795587,