著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,High Performance Poly-Si Device with Thin Gate Oxide Film Grown by Plasma Oxidation Technology,2003 International Conferences on Solid State Devices and Materials,,,2003,,,724-725,https://cir.nii.ac.jp/crid/1010282256782080137,