UV Induced Refractive Index Change of SiN Film and Its Application to Center Wavelangth Trimming of Vertically
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- 國分 泰雄
- 横浜国立大学
書誌事項
- タイトル
- UV Induced Refractive Index Change of SiN Film and Its Application to Center Wavelangth Trimming of Vertically
- 著者
- Toshiki Naganawa, Hirofumi Haeiwa, Yasuo Kokubun
収録刊行物
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- Jpn.J.Applied Physics Vol.43,No.12
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Jpn.J.Applied Physics Vol.43,No.12 5780-5784, 2004