Measurement of Oxygen Plasma for Diamond Etching Process
Bibliographic Information
- Title
- Measurement of Oxygen Plasma for Diamond Etching Process
- Author
- H. Yoshikawa, Y. Nakano, K. Masumura, N. Sato, T. Ikehata
Journal
-
- Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing 2-055
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Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing 2-055 327-328, 2005
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Details
-
- CRID
- 1010282256852030358
-
- Article Type
- journal article
-
- Data Source
-
- KAKEN
