著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Measurement of Oxygen Plasma for Diamond Etching Process,Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing 2-055,,,2005,,,327-328,https://cir.nii.ac.jp/crid/1010282256852030358,