Measurement of Oxygen Plasma for Diamond Etching Process
書誌事項
- タイトル
- Measurement of Oxygen Plasma for Diamond Etching Process
- 著者
- H. Yoshikawa, Y. Nakano, K. Masumura, N. Sato, T. Ikehata
収録刊行物
-
- Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing 2-055
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Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing 2-055 327-328, 2005