著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Plasma etching of high-κ and metal gate materials,"Vacuum Vol.80,No.7",,,2006,,,761-767,https://cir.nii.ac.jp/crid/1010282256909725581,