[Updated on Apr. 18] Integration of CiNii Articles into CiNii Research

Chamical Mechanical Polishing of SiC Substrate Using Enhanced Slurry Containing Nanobubbles with Active Gas Generated by Plasma

Bibliographic Information

Title
Chamical Mechanical Polishing of SiC Substrate Using Enhanced Slurry Containing Nanobubbles with Active Gas Generated by Plasma
Author
Shinya MIZUUCHI, Michio UNEDA, Kazutaka SHIBUYA, Yoshio NAKAMURA, Daizo ICHIKAWA and Ken-ichi ISHIKAWA

Journal

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Details

  • CRID
    1010282256942812032
  • Article Type
    journal article
  • Data Source
    • KAKEN

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