Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas
書誌事項
- タイトル
- Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas
- 著者
- Hidemitsu Aoki, Takuro Masuzumi, Makoto Hara, Daisuke Watanabe, Chiharu Kimura, Takashi Sugino
収録刊行物
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- Thin Solid Films Vol.518 lssue8
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Thin Solid Films Vol.518 lssue8 2102-2104, 2010