著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Plasma chemical behaviour of reactants and reaction products during inductively coupled C_F4 plasma Etching of SiO_2,"Plasma Sources Sci.Technol. Vol. 18, No. 4",,,2009,,,,https://cir.nii.ac.jp/crid/1010282257047008908,