Effect of wafer pre-cleaning and plasma irradiation to wafer surfaces for plasma-assisted surface activated bonding
書誌事項
- タイトル
- Effect of wafer pre-cleaning and plasma irradiation to wafer surfaces for plasma-assisted surface activated bonding
- 著者
- R.Takei, K.Yoshida, T.Mizumoto
収録刊行物
-
- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 49 86204-, 2010