Helicon-wave-excited- plasma sputtering epitaxy of Nb-doped Ti0-2 films on GaN
書誌事項
- タイトル
- Helicon-wave-excited- plasma sputtering epitaxy of Nb-doped Ti0-2 films on GaN
- 著者
- A.N.Fouda, K.Hazu, T.Nakayama, A.Tanaka, S.F.Chichibu
収録刊行物
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- Physica Status Solidi (c)
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Physica Status Solidi (c) 8 534-536, 2011