著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
鎌倉 良成,"Characteristics of Hot Hole Injection,Trapping, and Detrapping in Gate Oxide of Polycrystalline Silicon Thin-Film Transistors",Jpn. J. Appl. Phys.,,,2012,"vol. 51, no. 2",,,https://cir.nii.ac.jp/crid/1010282257097842433,