Characteristics of Hot Hole Injection,Trapping, and Detrapping in Gate Oxide of Polycrystalline Silicon Thin-Film Transistors
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- 鎌倉 良成
- 大阪大学
書誌事項
- タイトル
- Characteristics of Hot Hole Injection,Trapping, and Detrapping in Gate Oxide of Polycrystalline Silicon Thin-Film Transistors
- 著者
- Yoshinari Kamakura, Takashi Himukashi, Hiroshi Tsuji, and Kenji Taniguchi
収録刊行物
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- Jpn. J. Appl. Phys.
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Jpn. J. Appl. Phys. vol. 51, no. 2 2012