[Updated on Apr. 18] Integration of CiNii Articles into CiNii Research

In-situ annealing and fast rate silicon epitaxy on porous silicon by mesoplasma chemical vapor deposition

Bibliographic Information

Title
In-situ annealing and fast rate silicon epitaxy on porous silicon by mesoplasma chemical vapor deposition
Author
S. Zhang, Z. Lu, J. Sheng, P. Gao, X. Yang, S. Wu, J. Ye, M. Kambara

Journal

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Details

  • CRID
    1010282257286665344
  • Article Type
    journal article
  • Data Source
    • KAKEN

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