著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Suppression of oxygen vacancy formation in Hf-based high-k dielectrics by lanthanum incorporation,APPLIED PHYSICS LETTERS 91,,,2007,,,,https://cir.nii.ac.jp/crid/1010282257417325972,