著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,Application of SPELEEM to high-k gate dielectrics:relationshipbetween surface morphology and photoelectron spectra duringHf-silicide formation,Appl.Surf.Sci (In press),,,2007,,,,https://cir.nii.ac.jp/crid/1010282257437865732,