著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
,In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD,ECS Trans. 25,,,2009,,,309-315,https://cir.nii.ac.jp/crid/1010282257438118920,