Comparison of properties between Pr-Fe-B and Nd-Fe-B thick-film magnets applied to MEMS

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We investigated the possibility of R (Nd or Pr)-Fe-B thick-film magnets applied to MEMS. First, an enhancement in the thickness of the Si oxide layer on a Si substrate enabled us to increase the adhesion force between the Si substrate and Nd-Fe-B film. Then, after depositing a glass buffer layer on the Si substrate to obtain a thicker Si oxide layer, we compared the mechanical characteristics and magnetic properties of both Pr-Fe-B and Nd-Fe-B films. As the thickness of the glass buffer layer increased, the thickness of the Pr-Fe-B film could be enhanced without mechanical destruction. We had difficulty in exceeding the thickness of 100 μm in Nd-Fe-B films. Moreover, the (BH)max value of a 127-μm-Thick Pr-Fe-B film was higher by approximately 30 kJ m-3 than that of a 92-μm-Thick Nd-Fe-B film. The obtained results suggest that a Pr-Fe-B thick-film magnet is more suitable for MEMS applications.

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