著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
"両角, 潤樹 and 郷矢, 崇浩 and 久山, 智弘 and 江利口, 浩二 and 占部, 継一郎",In situ electrical monitoring of SiO₂/Si structures in low-temperature plasma using impedance spectroscopy,Japanese Journal of Applied Physics,0021-4922,IOP Publishing,2023-07,62,SI,,https://cir.nii.ac.jp/crid/1050015333085637248,