フェムト秒パルスレーザ熱反射法による金属薄膜の熱拡散率測定

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  • Thermal Diffusivity Measurement of Metallic Thin Films by Means of a Femtosecond Thermoreflectance Technique

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Recently, functional thin films such as amorphous and composition-modulated layered structure films have been developed in parallel to progress of high quality thin film production technology. Knowledge of reliable thermal constants are strongly required for designing the thin film products such as microelectronic devices, magnetic heads, magneto-optical disks, heat resisting coatings and so on. However, it is quite difficult to measure thermal transport phenomenon in the direction perpendicular to the film surface by using conventional method because typical thickness of thin films ranges from several tens of nm to several hundreds of nm. A new apparatus has been developed in order to measure the temperature response in the range from several tens of picosecond (ps) to several hundreds of ps by a thermoreflectance technique with a femtosecond laser pulse. The validity and usefulness of the apparatus and the relevant fundamentals were tested by obtaining the thermal diffusivity values of A] and Mo samples. The thermoreflectance signal, directly related to the thermal transport property perpendicular to the thin film surface without any influence from substrate, was obtained by both improvement and optimization of the optical and the detection systems. The thermal diffusivity value was determined by the least square method to fit the measured thermoreflectance signal with calculation using a single layer model excluding the effect of the substrate. (Received October 11, 2002)

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