A shock-tracking algorithm for surface evolution under reactive-ion etching

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S. Hamaguchi et al., Journal of Applied Physics 74, 5172 (1993) https://doi.org/10.1063/1.354282

A new algorithm that determines the evolution of a surface eroding under reactive-ion etching is presented. The surface motion is governed by both the Hamilton-Jacobi equation and the entropy condition for a given etch rate. The trajectories of "shocks" and "rarefaction waves" are then directly tracked, and thus this method may be regarded as a generalization of the method of characteristics. This allows slope discontinuities to be accurately calculated without artificial diffusion. The algorithm is compared with "geometric" surface evolution methods, such as the line-segment method.



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