著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Advances in resist technology and processing and Sturtevant, John L. and Society of Photo-optical Instrumentation Engineers and AZ Electronic Materials (USA) and Rohm & Haas Company and International SEMATECH","Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA",,SPIE,2005,Proceedings,,"0819457337,0819457337",,https://cir.nii.ac.jp/crid/1130000794264546560