著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Mathad, G. S. and Electrochemical Society. Dielectric Science and Technology Division and Electrochemical Society. Electronics and Photonics Division and Electrochemical Society. Electrodeposition Division and Electrochemical Society. Meeting","Copper interconnects, new contact and barrier metallurgies/structures, and low-k interlevel dielectrics III : at the 208th ECS meeting, October 16-21, 2005, Los Angeles, California, USA",,Electrochemical Society,2006,ECS transactions,,1566774993,,https://cir.nii.ac.jp/crid/1130000795060781952