著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Rooozeboom, F. and Electrochemical Society. Meeting and Electrochemical Society","Advanced gate stack, source/drain and channel engineering for Si-based CMOS 2: new materials, processes, and equipment",,Electrochemical Society,2006,ECS transactions,,1566775027,,https://cir.nii.ac.jp/crid/1130000797404558464