著者名,書名,版表示,出版者名,出版年,シリーズ名,番号,ISBN,ISSN,URL
"Huff, Howard R.","Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.",,Materials Research Society,1999,Materials Research Society symposium proceedings,,1558994742,,https://cir.nii.ac.jp/crid/1130000798013434880